三价铬电镀液中金属杂质离子浓度对镀层质量的影响及其处理效果  

Effect of Metal Impurity Ions in Trivalent Chromium Plating Bath on Coating Quality and Treatment Efficacy for Them

作　　者：王秋红[1] 胡光辉[1] 潘湛昌[1] 古晓雁 肖楚民[1] 徐波[1] 

机构地区：[1]广东工业大学轻工化工学院,广东广州510006 [2]佛山市昭信金属制品有限公司,广东佛山528131

出　　处：《材料保护》2011年第3期60-61,80,共3页Materials Protection

基　　金：广东省科技计划项目(2008B010600048);佛山市三水区科技计划项目(0903A)

摘　　要：三价铬电镀液中金属杂质离子累积到一定的程度,便会影响镀层质量。通过Hull Cell试验,探讨了TCR-3000三价铬电镀液对金属杂质离子的容忍度及其对镀层外观的影响。采用选择性阳离子处理树脂对镀液中的金属杂质离子进行了处理。结果表明:镀液对杂质Cu2+,N i2+,Zn2+的容忍度分别为10,50,60 mg/L;以选择性阳离子交换树脂处理污染的镀液,可使金属杂质离子浓度显著降低,镀液恢复正常使用。The endurance of TCR-3000 trivalent Cr plating bath to metal impurity ions and the effect of the impurity ions on the appearance of electroplated Cr coating were investigated using Hell cell tests.A selective cation exchange resin was adopted to treat the metal impurity ions in the plating bath.It was found that the plating bath could not work well when Cu2+,Ni2+ and Zn2+ concentrations were up to 10,50,60 mg/L respectively.It was feasible to greatly decrease the concentration of impurity ions by making use of selective cation exchange resin,and resultant treated plating bath was reusable.

关 键 词：三价铬电镀液 金属杂质离子 容忍度 交换树脂 处理技术 

分 类 号：TQ153.1[化学工程—电化学工业]