基于典型工况的半导体制冷系统优化方式探讨  

Discussion on semiconductor refrigeration system optimization based on typical operating states

作　　者：侯传勋[1,2] 张志利[1] 赵亮清[3] 姜毅[2] 

机构地区：[1]第二炮兵工程学院兵器发射理论与技术国家重点学科实验室,西安710025 [2]北京理工大学宇航学院,北京100081 [3]第二炮兵装备研究院,北京100085

出　　处：《低温与超导》2011年第3期16-22,44,共8页Cryogenics and Superconductivity

摘　　要：半导体制冷的特殊性,使制冷优化探讨对其工程应用具有重要指导意义。文中阐述了作为制冷片工作参数优化依据的最大效率E、等增量I、等功率P、综合最佳S、最大制冷量Q和最大温差T六种典型制冷工况。工况对比分析指出,温差亦是影响制冷性能的重要因素。在讨论各工况应用场合和制冷片损坏机理的基础上,探讨了温差优化和供电与控制方式优化措施。由此阐明了现有条件下提高制冷效率、增大制冷量和延长制冷片使用寿命的技术途径。Due to the particularity of semiconductor refrigeration, cooling optimization discussion has an important guiding significance for its engineering application. The paper discussed TEC＇s （ Thermoelectric Cooling Chip ） six special operating states, which were treated as the basis for the determination of TEC＇s optimal working parameters. The six states were maximum efficiency E, equal increment I, equal power P, synthetic optimal benefit S, maximum cooling capacity Q and maximum temperature difference T. The state -comparison analysis shows that temperature difference is another important factor that affects the performance of semiconductor refrigeration. Base on the discussion of each working state＇s applicable fields and TEC＇s damage mechanism, the measures for temperature difference optimization, powering optimization and controlling optimization were also studied. By this way, the technical approaches to improve cooling efficiency, to increase cooling capacity and to prolong TEC＇s working life were presented under the current conditions.

关 键 词：半导体制冷 制冷优化 典型工况 

分 类 号：TB65[一般工业技术—制冷工程]