纳米硅/铝氧化物杂化聚酰亚胺薄膜的制备与电性能研究  

Preparation and Study of Dielectric Property of Polyimide Films Hybrided with Nano Silica-alumina Oxide

作　　者：梁凤芝[1] 陈磊[1] 陈昊[1] 范勇[1] 

机构地区：[1]哈尔滨理工大学材料科学与工程学院,哈尔滨150040

出　　处：《绝缘材料》2011年第1期1-4,共4页Insulating Materials

基　　金：国家自然科学基金资助项目(50373008);黑龙江省科技攻关项目(GC04A216)

摘　　要：采用水热法制备纳米氧化铝溶胶,溶胶-凝胶法制备氧化硅溶胶,并将两者掺杂到聚酰亚胺(PI)基体中。实验中固定无机物掺杂总量为24%,通过调整纳米硅/铝氧化物的摩尔比,制备出一系列的无机纳米杂化聚酰亚胺薄膜。利用扫描电子显微镜(SEM)、耐电晕测试装置、耐击穿测试装置对薄膜进行了表征与测试。结果表明:硅溶胶掺杂量较小时,纳米粒子能较好地分散在聚酰亚胺基体中;杂化薄膜的耐电晕时间比纯膜有较大幅度提高,硅/铝摩尔比为1∶13时,耐电晕时间达到62.15 h;随着硅溶胶掺杂量的增加,杂化薄膜的击穿强度先减小后增大,但均比纯膜的低。A nano-alumina sol was synthesized by hydrothermal process and a silica sol was prepared by sol-gel method,then they were doped into polyamic acid matrix.A series of inorganic nano-hybrid polyimide films were prepared by adjusting the molar ratio of nano-silicon/aluminum oxides whose total content is 24%.The structure and properties of the films were characterized by SEM and measured by corona discharge measuring equipment and breakdown strength measuring system respectively.The results show that inorganic nano particles are well dispersed in the polyimide matrix when a little amount of silica sol is doped;the coronaresistant time of hybrid films is much longer than that of pure film and when the molar ratio of nano-silicon/aluminum oxides is 1：13,the corona-resistant time reaches up to 62.15 h;When increasing the doping amount of silica sol,the breakdown strength of the doped films first decreases and then increases,but is lower than that of the undoped film.

关 键 词：聚酰亚胺 硅铝氧化物 无机杂化 电性能 

分 类 号：TM215[一般工业技术—材料科学与工程] TQ323.7[电气工程—电工理论与新技术]