W波段带状注速调管电子光学系统的研究进展  

The Development of the Electron Optics System for W Band Sheet Beam Klystron

作　　者：阮存军[1] 王树忠[1] 

机构地区：[1]中国科学院电子学研究中国科学院高功率微波源与技术重点实验室,北京100190

出　　处：《真空电子技术》2010年第6期12-16,共5页Vacuum Electronics

基　　金：国家自然科学基金资助项目(批准号:60501019;10775139;60971073)

摘　　要：带状注速调管以其在毫米波段可获得高功率和高增益输出,以及小型化、紧凑型、平面微加工成形等的技术优势而备受国际前沿领域广泛关注。本文重点给出了正在开展的W波段带状注速调管的研究工作,通过采用均匀场聚焦的带状电子注的方式,研制出了椭圆截面带状电子注成形与传输的束流样管。通过实验测试获得的电子枪压缩和成形的带状电子注截面为10 mm×0.7 mm,且在电子注电压为20~82 kV,电流0.5~4.27 A时,长度为100 mm的漂移通道内电子注传输的直流通过率达到98%以上,从而验证了采用均匀场传输带状注的方案是完全可行的。The development of millimeter wave sheet beam klystron recently indicated that this type of device have much more advantages such as high gain and output power,compact structures,and easy manufacture with plane numerical control method etc.In this paper,the development of the electron optics system for W-band sheet beam klystron has been introduced with scheme of uniform magnetic field system.The ellipse cross section electron gun and uniform magnetic system are used to form and transport the sheet electron beam with the drift tube length about 100 mm.After the sheet beam tube is manufactured,the transmission rate and cross-section experiment are performed.With the beam voltage of 20~82 kV,and beam current of 0.5~4.27 A,the transmission rate is more than 98%,and the beam cross-section is about 10 mm×0.7 mm.The results indicate that it is completely validity to transport the sheet electron bean effectively with the scheme of uniform magnetic field system.

关 键 词：带状电子注 成形与传输 均匀场聚焦 直流通过率 

分 类 号：TN122.5[电子电信—物理电子学]