双咪唑光敏体系紫外光引发聚合甲基丙烯酸甲酯动力学和应用研究  

KINETIC AND APPLIED STUDY OF UV LIGHT PHOTOSENSITIVEINITIATING POLYMERIZATION OF METHYLMETHACRYLATEBY BIIMIDAZOLE PHOTOSENSITIVE SYSTEM

作　　者：徐锦棋[1] 高放[1] 杨永源[1] 李立东[1] 冯树京[1] 

机构地区：[1]中国科学院感光化学研究所

出　　处：《感光科学与光化学》1999年第3期247-252,共6页Photographic Science and Photochemistry

基　　金：国家自然科学基金

摘　　要：用光敏剂４，４′二（Ｎ，Ｎ′二甲基氨基）苯甲酮（简称米氏酮，ＭＫ）、引发剂邻氯代六芳基双咪唑（ｏＣｌＨＡＢＩ）和氢给体助引发剂十二烷基硫醇（ＳＨ）组成光敏引发体系．研究了在高压汞灯照射下，甲基丙烯酸甲酯（ＭＭＡ）光聚合速率和该敏化体系每一个组分，包括ＭＫ、ｏＣｌＨＡＢＩ、ＳＨ和ＭＭＡ的关系，还研究了该体系在ＰＳ版材上的应用。The ultraviolet photosensitive initiating system is composed of 4,4'bis(N,N'dimethylamino) benzophenone (MK), 2chlorohexaarylbiimidazole (oClHABI) and a hydrogen donor coinitiator ndodecyl mercaptan (SH). Under the irradiation by high pressure mercury lamp, the relationship between the photopolymerization rate of MMA and the concentration of each component of the system, including MK, oClHABI, SH and MMA, was studied. The excellent results have been obtained through studying the system's application on PS printing plate.\=

关 键 词：光敏高分子 双咪唑 光聚合 光敏引发体系 PMMA 

分 类 号：TQ314.241[化学工程—高聚物工业] O632.52[理学—高分子化学]