利用浆料直写无模成型技术制备自支撑TiO_2光降解器件  

TiO_2 Photolysis Device Fabricated by Direct Ink Write Assembly

作　　者：孙竞博[1] 李勃[2] 蔡坤鹏[1] 周济[1] 李龙土[1] 

机构地区：[1]清华大学材料科学与工程系新型陶瓷与精细工艺国家重点实验室,北京100084 [2]清华大学深圳研究生院新材料研究所,深圳518055

出　　处：《无机材料学报》2011年第3期300-304,共5页Journal of Inorganic Materials

基　　金：国家自然科学基金(90922025;50621201;50632030;10774087)~~

摘　　要：介绍了一种基于光敏特性陶瓷浆料的浆料直写无模三维成型技术制备的线条直径为270μm的TiO2木堆结构光降解器件.对光敏浆料的配制方法、浆料直写无模成型的工艺原理进行了研究;利用TEM和XRD表征光敏浆料中TiO2粉体的形貌和物相;对器件的光降解性能进行了分析与测试;利用光学显微镜和SEM对成型后的样品结构、尺寸及表面微观形貌进行了分析,并基于此分析给出了这种器件高催化效率的原因.实验结果显示,该器件具有完整的三维木堆结构,表面粗糙多孔,极大地增加了光催化的作用面积,从而使其具有较高的光降解效率.在紫外光照射10min后,初始浓度为4mg/L的亚甲基蓝溶液降解率达到76%,紫外光照射20min后,亚甲基蓝溶液降解率可达91%.A kind of photosensitive ceramic inks was developed for Direct-Write Assembly（DWA）.A TiO2 based photolysis device of woodpile structure with filament diameter of around 270 μm was fabricated through this method.The preparation of the photosensitive ink and the principle of the DWA were investigated in order to obtain ink with proper rheology.XRD and TEM were used to characterize the phase and morphology of the TiO2 powder in the ink.Optics microscope was applied to analyze the internal architecture and typical size of the woodpile structure.The sample immersed in methylene-blue solution was radiated under UV-light for 20 min and the transmittance of the solution measured by UV-Vis spectrophotometer.Under the UV-light irradiation for 10 min,the degradation rate of methylene blue solution with initial concentration of 4mg/L was 76%,and increased to 91% after UV radiation for 20 min.SEM was used to study the filament surface morphology of the woodpile and investigate the enhancement mechanism of the high photolysis performance based on these results.The effective photolysis performance can be attributed to the 3D woodpile structure with rough porous surface,which greatly increases the area of the photocatalysis reaction.

关 键 词：直写成型 TIO2 光降解 

分 类 号：TQ123[化学工程—无机化工]