疏水性有序介孔氧化硅薄膜的制备  

Synthesis of Hydrophobic Ordered Mesoporous Silica Films

作　　者：彭迟香[1] 吴国友[1] 余煜玺[1,2] 程璇[1,2] 

机构地区：[1]厦门大学材料学院材料科学与工程系,厦门361005 [2]特种先进材料福建省重点实验室,厦门361005

出　　处：《化学学报》2011年第6期659-665,共7页Acta Chimica Sinica

基　　金：福建省特种先进材料重点实验室基金(No.2006L2003);福建省自然科学基金(No.2009J05133)资助项目

摘　　要：采用溶胶-凝胶技术并结合蒸发诱导自组装工艺,以三嵌段共聚物EO20PO70EO20(P123)为模板剂,使用浸渍提拉法制备了有序介孔氧化硅薄膜,并使用不同的表面修饰剂对薄膜进行表面处理,制备了疏水性有序介孔氧化硅薄膜.利用FT-IR、小角XRD、HRTEM分别表征薄膜的化学物种和孔结构,探讨了热处理温度和老化时间对薄膜介孔结构的影响,通过接触角测试研究薄膜的疏水性能,考察了修饰剂种类、修饰浓度和修饰时间对薄膜疏水性的影响,结果表明所制备的薄膜为高度有序的介孔氧化硅薄膜,孔径大小约为8 nm;表面修饰对薄膜的有序性有一定影响,经三甲基氯硅烷(TMCS)和γ-氨丙基三乙氧基硅烷(KH-550)修饰后的薄膜具有很好的疏水性能,接触角分别为112°和96°;修饰后薄膜的水汽稳定性良好,仍能保持有序介孔结构,孔径达7.5 nm,接触角达93°.Mesoporous silica films were synthesized by sol-gel process combined with evaporation-induced self-assembly（EISA） process using block copolymer EO20PO70EO20（P123） as a template.The films were deposited on glass substrates by dip-coating method and were characterized by Fourier transform infrared（FT-IR） spectros-copy,small-angle X-ray diffraction（SAXD） spectroscopy,and high resolution transmission electron microscopy（HRTEM）.The effects of heat treatment temperature and aging time on the micro-structure of mesoporous silica films were investigated.The surface modifications of silica films with different concentrations,aging time and temperatures were studied using trimethylchlorosilane（TMCS）,γ-amino-propyltriethoxysilane（KH-550） and po-lymethyl triethoxy silane（PTS）.The results showed that the high degree orders of meosporous silica thin films with the pore sizes of 8 nm were obtained and the highly ordered mesoporous structures were slightly changed after the surface modification.The surfaces of films after modified with TMCS and KH-550 became hydrophobic.The con-tact angles of the thin films modified with TMCS and KH-550 were 112° and 96°,respectively.Furthermore,the modified thin films exhibited good moisture stability.The ordered mesoporous structure remained unchanged with the contact angle of 93°.

关 键 词：有序介孔 氧化硅薄膜 表面修饰 

分 类 号：O613.72[理学—无机化学]