提高拮抗菌WB3对番茄灰霉病菌拮抗能力的He-Ne激光与氯化锂复合诱变技术  

Improvement of Antagonistic Activity of Bacteria WB3 Against Botrytis Cinerea by He-Ne Laser and licl

作　　者：任涛涛[1] 田永永[1] 谢云[1] 陈五岭[1] 

机构地区：[1]西北大学生命科学学院,西安710069

出　　处：《光子学报》2011年第3期443-447,共5页Acta Photonica Sinica

基　　金：山西省自然基金(No.20031096)资助

摘　　要：利用He-Ne激光(波长632.8 nm,功率12 mW)与氯化锂复合诱变一株番茄灰霉病菌拮抗菌WB3,获得14株拮抗效果突出的菌株,其最大抑菌带宽为15.7 mm.综合单一诱变组里菌株致死率以及拮抗能力的大小,其中辐照时间为30 min,氯化锂浓度为1.2%时为复合诱变最佳条件.经过复合诱变,L8拮抗菌最高抑菌带宽可提高14%以上,而单一He-Ne激光诱变后抑菌带宽提高8.8%,单一氯化锂诱变后抑菌带宽提高9%.L8菌株生长迅速,经传代培养证明其抑菌性能具有稳定遗传性.该实验研究He-Ne激光与氯化锂复合诱变枯草芽孢杆菌WB3的方法可应用于番茄灰霉病的生物防治领域.He-Na laser（λ=632.8 nm,P=12 mW） licl was used to irradiate B.subtilis WB3 which had an antagonistic ability on Botrytis cinerea.14 strains that have prominent antagonistic effects were obtained,and the maximum inhibitory bandwidth is 15.7 mm.According to the mortality rates and the size of antagonistic of single mutagenesis group,the optimization condition of irradiation time of 30 min and the density of licl of 1.2% were obtained.After multiplicity mutation,the max inhibiting belt width is L8 that raised more than 14%,however single He-Ne laser and licl irradiation could only raise 8.8% and 9%.The strains grew rapidly with stable heredity.The proposed experimental results the He-Na laser licl mutagenesis of Bacillus subtilistest WB3 show a broad application prospect for the biological control of botrytis cinerea.

关 键 词：HE-NE激光 氯化锂 番茄灰霉病菌 拮抗菌WB3 复合诱变 

分 类 号：Q933[生物学—微生物学]