铜蒸气激光器等离子体阻抗动态特性研究  

STUDY ON THE DYNAMIC PLASMA RESISTANCE CHARACTERISTICS IN COPPER VAPOR LASER

作　　者：于德利[1] 陶永祥[1] 尹宪华[1] 王润文[1] 陈林[1] 杨燕[1] 李海兰[1] 

机构地区：[1]中国科学院上海光机所

出　　处：《强激光与粒子束》1999年第3期302-304,共3页High Power Laser and Particle Beams

基　　金：国家科委"九五"攻关项目

摘　　要：给出了铜蒸气激光器放电电路各参数的表达式及取值。与铜蒸气激光器动力学模型相结合，讨论了铜蒸气激光器动力学过程中由于放电管内等离子体参数的变化引起等离子体阻抗动态演变过程，并与采用固定等离子体参数的等离子体阻抗进行了比较。The expressions or values of discharge circle parameters for copper vapor laser are presented. Combined with the copper vapor laser kinetic model, the plasma resistance characteristics have been studied as the plasma parameters in the discharge tube changing, and they are compared with the plasma resistance characteristics deduced from the static plasma parameters in discharge tube.

关 键 词：铜蒸气 激光器 动力学模型 等离子体电阻 

分 类 号：TN248.21[电子电信—物理电子学]