柔性衬底上铝背电极制备及相关特性研究  

Preparation and characteristics of aluminum back electrodes on flexible substrates

作　　者：岳红云[1,2] 吴爱民[1,2] 冯煜东[3] 胡娟[1,2] 张学宇[1,2] 李廷举[1] 

机构地区：[1]大连理工大学材料科学与工程学院,辽宁大连116024 [2]大连理工大学三束材料改性教育部重点实验室,辽宁大连116024 [3]中国空间技术研究院兰州物理所,甘肃兰州730000

出　　处：《大连理工大学学报》2011年第2期210-214,共5页Journal of Dalian University of Technology

基　　金：教育部留学回国人员科研启动基金资助项目(200611AA03);表面工程技术国家级重点实验室基金资助项目(9140C540105080C5402)

摘　　要：采用射频磁控溅射技术在聚酰亚胺柔性衬底上制备硅基薄膜太阳能电池用铝背电极,研究了不同溅射功率和工作气压条件对铝电极薄膜性能的影响.利用原子力显微镜分析表征了薄膜的表面形貌和粗糙度,薄膜的电学性能和光学性能分别采用四探针测量仪和紫外可见近红外分光光度计进行分析表征.测试结果表明:随着溅射功率的增加,薄膜表面均方根粗糙度迅速增加,漫反射率提高,薄膜的最高平均漫反射率高达70%;同时薄膜电阻率降低.工作气压为0.5Pa时所制备的薄膜具有较低的电阻率和良好的漫反射率.综合考虑薄膜的电学性能与光学性能,薄膜的最佳制备条件为溅射功率300～450W、工作气压0.5Pa.Al thin films were deposited on flexible polyimide substrates by radio frequency magnetron sputtering method to make aluminum back electrode for Si-thin film solar cells.The effects of sputtering power and working pressure on the properties of Al electrodes were carried out.Atomic force microscope（AFM） was used to examine the surface morphology and roughness of the films.The electrical and optical properties of the films were characterized by four-probe meter and UV/VIS near-IR spectrophotometer,respectively.The results show that,with the increasing of the sputtering power,the root mean square surface roughness of Al thin films is improved greatly,and the higher the sputtering power is,the higher the diffuse reflectivity and conductivity of Al thin films are.The average diffuse reflectance of the film reaches to 70%.The films deposited at 0.5 Pa perform lower resistivity and higher reflectivity.As concern to the electrical and optical properties of the films,the Al thin films prepared at 300-450 W and 0.5 Pa have excellent comprehensive performance.

关 键 词：薄膜太阳能电池 柔性衬底 背电极 反射光谱 

分 类 号：TN304.2[电子电信—物理电子学]