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作 者:Guo Ximing Guo Bin Sun Xuemei Zhang Qingyuan Shi Tongshun
机构地区:[1]School of Materials Science and Engineering, Harbin Institute of Technology, Harbin, Heilongjiang 150001, China [2]The Academy of Science and Technology, Harbin Institute of Technology, Harbin, Heilongjiang 150001, China [3]The Campus Hospitals of Harbin Institute of Technology, Harbin, Heilongjiang 150001, China [4]Department of Oncology, The Affiliated Tumor Hospital of Harbin Medical University, Harbin, Heilongjiang 150040, China [5]College of Chemistry, Jilin University, Changchun, Jilin 130023, China
出 处:《Chinese Journal of Chemistry》2011年第2期363-368,共6页中国化学(英文版)
摘 要:A method for the fabrication of an improved class of controllable fluorescence intensity, highly sensitive and photostable porphyrin doped silica nanoparticles (PDSNPs) was demonstrated. The fluorescence intensity of PDSNPs could be controlled by finely tuning self-dissociated time of the precursor of porphyrin-bridged silsesquioxane. Porphyrin was well dispersed into the silica matrix due to the covalent attachment in the system, thus entirely avoiding the porphyrin leakage and fluorescence quenching effects. The resultant PDSNPs with a narrow size-distributed region and a regular spherical structure can be attained.A method for the fabrication of an improved class of controllable fluorescence intensity, highly sensitive and photostable porphyrin doped silica nanoparticles (PDSNPs) was demonstrated. The fluorescence intensity of PDSNPs could be controlled by finely tuning self-dissociated time of the precursor of porphyrin-bridged silsesquioxane. Porphyrin was well dispersed into the silica matrix due to the covalent attachment in the system, thus entirely avoiding the porphyrin leakage and fluorescence quenching effects. The resultant PDSNPs with a narrow size-distributed region and a regular spherical structure can be attained.
关 键 词:self-direct dissociation porphyrin-bridged silsesquioxane porphyrin-doped silica nanoparticles
分 类 号:TQ127.2[化学工程—无机化工] TB332[一般工业技术—材料科学与工程]
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