Zn-Al涂层腐蚀电化学行为研究  

Electrochemical behavior of Zn-Al coating in CASS

作　　者：刘毅[1] 魏世丞[1] 王玉江[1] 徐滨士[1] 

机构地区：[1]装甲兵工程学院装备再制造技术国防科技重点实验室,北京100072

出　　处：《功能材料》2011年第B04期226-229,共4页Journal of Functional Materials

基　　金：国家自然科学基金重点资助项目(50735006);国家自然科学基金资助项目(50971132);国家科技支撑计划资助项目(2007BAB27B02-04)

摘　　要：通过电化学交流阻抗谱(EIS)研究了Zn-Al涂层在铜加速醋酸盐雾试验中的腐蚀行为,建立了等效电路模型并分析了相关电化学参数随时间的变化规律。采用扫描电镜及能谱仪分析了涂层腐蚀后的形貌及成分组成,阐释了电化学参数的演变规律。结果表明,盐雾试验中Zn-Al涂层的腐蚀由电化学反应控制逐渐转变为扩散控制,最后进入基体腐蚀阶段。Ba0.7 Sr0.3 TiO3 thin films were deposited on alumina ceramic substrates by RF magnetron sputtering method and BST parallel plate tunable capacitors were prepared by photolithographic process. The effect of deposition conditions on dielectric tunability and loss tangent of BST thin films was investigated. It was found that the BST thin film with about 52% tunability and about 0.8% loss tangent were deposited at 4 Pa ambient pressure with an O2/Ar ratio of 30 = 70, and substrate temperature of 800℃. Measurements indicated that the quality factor of BST capacitors decreased from 125 to 42 with test frequency increasing from 1 to 100MHz.

关 键 词：Zn-Al涂层 腐蚀 电化学交流阻抗 

分 类 号：TG174.3[金属学及工艺—金属表面处理]