阴离子对铝酸钠溶液深度脱硅的影响  

Effects of Anions on Deep Desilication of Sodium Aluminate Solution

作　　者：王雅静[1] 李宏亮[1] 庞常健[1] 翟玉春[2] 张征[1] 

机构地区：[1]沈阳化工大学应用化学学院,辽宁沈阳110142 [2]东北大学材料与冶金学院,辽宁沈阳110004

出　　处：《过程工程学报》2011年第2期239-243,共5页The Chinese Journal of Process Engineering

基　　金：国家重点基础研究发展规划(973)基金资助项目(编号:G199904690-4);辽宁省教育厅高等学校科学研究基金资助项目(编号:05L339)

摘　　要：研究了不同阴离子(SO42-,CO32-,Cl-)对铝酸钠溶液深度脱硅的影响.通过对Na2SO4,Na2CO3和NaCl用量、反应温度、时间、Al2O3浓度、溶液苛性比ak、搅拌速度影响的考察,确定了最佳工艺条件.在95℃,Al2O3 150g/L,ak=1.5及搅拌速度867r/min条件下脱硅110min后,铝酸钠溶液中硅量指数达2938,在杂质用量30g/L时,含SO42-,CO32-,Cl-溶液的硅量指数分别可达3943,3545和3221.在阴离子浓度为0～70g/L时,SO42-促进溶液深度脱硅,CO32-,Cl-均先促进后抑制脱硅,通过硅渣XRD衍射分析,得到了SO42-,CO32-,Cl-对脱硅影响的变化规律.The influences of anions（SO42-,CO32-and Cl-） on deep desilication of sodium aluminate solution were investigated.The optimal conditions of desilication were studied by examining the temperature,time,anion and Al2O3 concentration,ak and stirring speed.Under the conditions of 95℃,Al2O3 150 g/L,ak 1.5,and stirring speed 867 r/min,after 110 min the silica module was above 3815,and at the Al2O3 concentration of 30 g/L,the silica module was above 3943,3545 and 3221.When the concentration of anion was 0～70 g/L,deep desilication was promoted by SO42-,but deep desilication was promoted firstly and then inhibited by CO32-and Cl-.Silica residue was analyzed by XRD,and the desilication mechanism by SO42-,CO32-and Cl-clarified.

关 键 词：铝酸钠溶液 深度脱硅 SO42- CO32- Cl- 

分 类 号：TF801[冶金工程—有色金属冶金]