Optical design for EUV lithography source collector  

作　　者：张树青 王骐 祝东远 李润顺 刘畅 

机构地区：[1]Research Center for Space Optical Engineering,Harbin Institute of Technology [2]Institute of Opto-Electronics,Harbin Institute of Technology [3]Center for Composite Material,Harbin Institute of Technology

出　　处：《Chinese Optics Letters》2011年第5期66-69,共4页中国光学快报（英文版）

基　　金：supported by the State Key Program ofthe National Natural Science of China (No. 60838005);the Major National Science and Technology SpecialProjects (No. 2008ZX02501)

摘　　要：Wolter I collector is the best collector for extreme ultraviolet （EUV） lithography, which has a series of nested mirrors. It has high collection efficiency and can obtain more uniform intensity distribution at the intermediate focus （IF）. A new design with the calculation sequence from the outer mirror to the inner one on the premise of satisfying the requirements of the collector is introduced. Based on this concept, a computer program is established and the optical parameters of the collector using the program is calculated. The design results indicate that the collector satisfies all the requirements.Wolter I collector is the best collector for extreme ultraviolet （EUV） lithography, which has a series of nested mirrors. It has high collection efficiency and can obtain more uniform intensity distribution at the intermediate focus （IF）. A new design with the calculation sequence from the outer mirror to the inner one on the premise of satisfying the requirements of the collector is introduced. Based on this concept, a computer program is established and the optical parameters of the collector using the program is calculated. The design results indicate that the collector satisfies all the requirements.

关 键 词：Extreme ultraviolet lithography Optical design 

分 类 号：TN305.7[电子电信—物理电子学]