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机构地区:[1]天津大学化工学院,天津300072 [2]天津高科新技术发展有限公司,天津300072
出 处:《电镀与精饰》1999年第5期6-8,共3页Plating & Finishing
摘 要:在以氨基磺酸镍和氨基硫酸钴为主盐的电解液中,镍作阳极,p H= 4.0,55℃条件下,采用2 A/dm 2 的阴极电流密度,可以电沉积出钴含量随厚度而变化的 Ni Co 合金层。实验结果表明,随着通电量的增加,合金镀层中的钴含量不断下降。由镀层性能测试可以看出,随着通电量的增加,合金镀层的硬度降低,内应力减小。Ni Co alloy layer in which Co content is varied with thickness was electrodeposited in electrolyte containing nickel sulfamate and cobalt sulfamate as main salts and metallic nickel as anode at 55℃ and 2.0 A/dm 2 cathodic current density. The experimental results show that Co content in the alloy layer is decrease gradually with the increase in electricity passed through the electrolyte, i.e. with the increase in thickness of the alloy layer. It can be seen from the results of alloy layer property measurements that with the increase in electricity passed through the electrolyte the hardness of the alloy is lowered and the internal stress of the alloy is decreased.
分 类 号:TQ153.2[化学工程—电化学工业]
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