电镀废水处理站DTCR辅助氢氧化物沉淀工艺改造  

Improvement of the DTCR-assistant hydroxide precipitation process in electroplating wastewater treatment station

作　　者：王本洋[1] 简丽[1] 

机构地区：[1]中国航空规划建设发展有限公司第二设计研究院,北京100120

出　　处：《给水排水》2011年第6期54-57,共4页Water & Wastewater Engineering

摘　　要：某废水处理站改造前采用传统氢氧化物沉淀工艺处理高浓度含铬、氰镉电镀废水,运行不稳定,出水不能达标排放。工艺改造后增加了高分子重金属捕集沉淀剂DTCR辅助去除重金属,在含铬废水DTCR投加量为50 mg/L、含氰镉废水DTCR投加量为10 mg/L条件下,出水总铬、镉分别稳定在0.5 mg/L、0.2 mg/L以下,远低于《电镀污染物排放标准》(GB 21900—2008)限值。Before reconstruction project,some wastewater treatment station used the traditional hydroxide precipitation process to treat electroplating wastewater which containing high concentration chromium and cadmium cyanide,but the treatment effect was not stable and effluent could not meet the discharge standards.After improvement,the polymer heavy metal chelating agent DTCR was used to help heavy metal removal.When the DTCR dosage for chromium wastewater and cadmium cyanide wastewater were 50 mg/L and 10 mg/L respectively,the total chromium,cadmium in effluent were stabilized below 0.5 mg/L and 0.2 mg/L respectively,which was far below the standards of Emission standard of pollutants for electroplating（GB 21900—2008）.

关 键 词：电镀废水 DTCR 沉淀 重金属 铬 氰镉 

分 类 号：X792.03[环境科学与工程—环境工程]