物理气相沉积TiAlN涂层的研究进展  

Recent Progresses in Physical Vapor Deposited TiAlN Coating

作　　者：曹华伟[1] 张程煜[1] 乔生儒[1] 曹晓雨[1] 

机构地区：[1]西北工业大学超高温结构复合材料国防科技重点实验室,西安710072

出　　处：《材料导报》2011年第11期25-29,共5页Materials Reports

基　　金：国家自然科学基金面上项目(50702045);高等学校博士学科点专项科研基金(20070699007);新世纪优秀人才支持计划(NCET-08-0460)

摘　　要：概述了物理气相沉积TiAlN涂层的研究现状及发展趋势,详细分析了制备方法、Al含量、N2流量、基体偏压、温度以及其他元素对TiAlN涂层的涂层结构、硬度、高温抗氧化性和耐腐蚀性等性能的影响。目前制备的TiAlN涂层存在残余应力较大、表面液滴数量较多和涂层致密度差等问题。为进一步促进TiAlN涂层的应用,今后还需探索该涂层的制备方法,优化其制备工艺。多元纳米复合涂层和超点阵多层涂层是两个具有潜力的发展方向。The research and development of physical vapor deposited TiAIN coatings are summarized. Thepreparation methods, aluminum content, mtrogen ilOW rate, substrate bias,temperature and alloying elements have significant effects on the properties of TiA1N coatings, including crystal structure, hardness, high temperature oxidation resistance and corrosion resistance. Although the coating is used in many applications, there are many drawbacks which limit its performance, such as high residual stress, formation of large droplets and poor density. For further ap- plication, new preparation method should be explored. Meanwhile, the optimization of the processing technology should he made. It is potential to develop multiple nano-composite coating and superlattiee multi-layer coating in the future.

关 键 词：TIALN涂层 制备方法 晶体结构 硬度 高温抗氧化性 

分 类 号：TG714[金属学及工艺—刀具与模具]