投影光刻中相位光栅对准标记变形解决方案  

Analysis For Solution to Deformed Mark of Phase Grating Alignment System in the Projection Lithography

作　　者：殷履文[1] 盖玉喜[1] 

机构地区：[1]中国电子科技集团公司第五十五研究所,南京210016

出　　处：《电子工业专用设备》2011年第6期7-9,36,共4页Equipment for Electronic Products Manufacturing

摘　　要：描述了相位光栅对准法在步进重复投影光刻机中的运用,通过比较同轴对准系统和离轴对准系统的原理,工作过程,阐述了当对准标记产生变形时离轴对准系统能更好地修正偏差从而保证光刻工艺中套刻精度的要求。Described application of phase grating alignment system in the step-and-repeat projection lithography.Through comparing the principle and working process of TTL（through the lens）with Off Axis alignment system,it states Off Axis alignment system can eliminate deviation better when alignment mark is becoming deformed,so it meets the requirement of photolithographic process of overlay.

关 键 词：对准系统 标记 相位光栅 

分 类 号：TN305.7[电子电信—物理电子学]