铁基底上扩散感应的CVD金刚石成核  

Diffusion induced Nucleation of CVD Diamond on Ferrous Substrate

作　　者：唐璧玉[1] 杨国伟[1] 任志昂[1] 蔡孟秋[1] 

机构地区：[1]湘潭大学物理系,湘潭411105

出　　处：《材料开发与应用》1999年第6期14-16,共3页Development and Application of Materials

摘　　要：在硅和铁基底上同时进行ＣＶＤ 金刚石的沉积，利用硅基底上的金刚石成核感应金刚石在铁基底上直接成核。研究表明，硅和铁基底上不同的沉积过程导致了铁基底上碳原子表面扩散的加强，从而促成了ＣＶＤ 金刚石在铁基底上的直接成核。表面扩散对ＣＶＤ 金刚石成核有重要影响。Diamond nucleation on ferrous substrate was realized with the inducement of diamond nucleation on silicon substrate in the hot-filament CVD system. It is shown that the difference of deposition processes on ferrous and silicon substrates strengthens the surface diffusion of carbon on ferrous surface, and prompts direct nucleation of diamond on ferrous substrate. The influence of surface diffusion on CVD diamond nucleation was found very important.

关 键 词：CVD金刚石 铁基底 感应成核 表面扩散 

分 类 号：TG174.45[金属学及工艺—金属表面处理]