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机构地区:[1]中国科学院金属研究所
出 处:《材料研究学报》1999年第6期621-626,共6页Chinese Journal of Materials Research
基 金:国家自然科学基金!59471067
摘 要:制备了厚度为25~225nm的C、Al、Ti、Cu、Nb、Mo、Ag、Ta和W9种纯元素薄膜样品,用化学分析方法测定了薄膜的质量厚度pz,并用电子探针测定了软X射线CKα、BKα的出射强度几和穿过薄膜后的强度I根据X射线通过物质时的指数衰减定律:I/I0=e-μpz得到了这9种纯元素对CKα、BKα辐射的质量吸收系数μ。9 kinds of films with the thickness rang from 25 to 225urn were made, They are isolated thin films of pure elements C, Al, Cu, Ag and films of Al, Ti, Nb, Mo, Ag, Ta and W evaporated on a thin nitrocellulose substrate. Their mass thickness pc were determined with ICP spectrometer and the transmissivities (I/I0) for radiation CKαand BKα were measured by means of EPMA. According to the Beer's law I/I0 =eμ-pz, the mass absorption coefficients (MACs:μ) of C, Al, Ti, Cu, Nb, Mo,Ag, Ta and W for CKα, BKα were obtained. The values of MAC obtained from present work were used to quantitative EPMA for standard TiC, NbC, Mo2C, TaC, TiB2 and NbB2. The results show that the corrected mass fractions with Ruste's and PAP's correction models are of better agreement with chemical values.
关 键 词:质量吸收系数 软X射线 薄膜 质量厚度 电子探针
分 类 号:TH838[机械工程—仪器科学与技术]
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