电子束曝光制备光滑曲面微结构  

Fabrication of Microstructures with Smooth Curved Surface by Electron Beam Lithography

作　　者：孔祥东[1] 韩立[1] 初明璋[1] 李建国[1] 

机构地区：[1]中国科学院电工研究所,北京100190

出　　处：《微纳电子技术》2011年第7期460-463,共4页Micronanoelectronic Technology

基　　金：国家自然科学基金资助课题(10572078);中国博士后科学基金面上资助项目(20090460514)

摘　　要：提出了一种基于电子束曝光制备光滑曲面微结构的新技术。对聚合物玻璃转化温度与分子量之间的关系、分子量与电子束吸收能量密度之间的关系进行了理论分析,发现聚合物玻璃转化温度随吸收能量密度的增加而减小。以此为依据,在FEI820Dual Beam FIB/SEM系统上采用15keV、不同剂量的电子束对S1805正性抗蚀剂微结构进行了曝光实验,得到了具有不同高度、轮廓清晰的光滑曲面微结构,为使用电子束曝光技术加工光滑曲面微结构提供了新工艺。A novel technique to fabricate the microstructure with the smooth curved surface by electron-beam lithography was presented.The relations of the polymer glass transition temperature and the molecular weight,the molecular weight and the absorbed energy density were analyzed,respectively.The result shows that the glass transition temperature decreases with the increase of the absorbed energy density.Based on this,the electron beam lithography experiments for the S1805 positive photoresist microstructure were conducted on the FEI 820 DualBeam FIB/SEM system with different doses at 15 keV.The smooth curved surfaces with different heights and distinct contour were obtained.The new technology is provided for the fabrication of microstructures with smooth curved surface by electron-beam lithography.

关 键 词：电子束 分子量 玻璃转换温度 吸收能量密度 剂量 

分 类 号：TN305.7[电子电信—物理电子学]