计量光栅盘真空镀铬机理与工艺研究  

Research on Mechanism and Techniques of Vacuum Plating of Cr on Metrology Grating

作　　者：陈赟[1] 王晓峰[1] 李艳茹[1] 

机构地区：[1]中国科学院长春光学精密机械与物理研究所,长春130033

出　　处：《长春理工大学学报（自然科学版）》2011年第2期1-4,共4页Journal of Changchun University of Science and Technology(Natural Science Edition)

基　　金：中国科学院长春光学精密机械与物理研究所三期创新项目(Y00332H100)

摘　　要：在计量光栅盘的制作过程中,真空镀铬是影响计量光栅盘精度和成品率的主要工序之一。为了提高计量光栅盘的精度及成品率,对计量光栅盘真空镀铬原理及膜层形成机理进行了分析,给出了影响铬层致密性及牢固度的主要因素与铬层均匀性和蒸发距离之间的关系式,并针对其原因对相关工艺进行了改进,实验证明改进后的工艺对改善铬膜的致密性和牢固度及均匀性起到了一定的作用,使计量光栅盘的成品率提高了10%,同时也为进一步改善后续工艺提供了理论依据。During the producing metrology grating,vacuum plating of Cr is one of main working procedures affecting the precision and finished product rate of metrology grating.In order to improve the precision and increase finished product rate of metrology grating,we analyze the theory of vacuum plating of Cr on metrology grating and the formation mechanism of Cr film,the main factors affecting compactness and fastness of Cr film are given,the relations between Cr film uniformity and vaporization distance are presented,and correlative techniques is improved based on the reason.The results show that improved techniques can improve the compactness,fastness and uniformity of Cr film.The techniques makes the finished product rate of metrology grating increase 10%,which provides theoretical basis to improve the techniques in the next stage.

关 键 词：真空镀铬 致密性 均匀性 蒸发距离 

分 类 号：TP135[自动化与计算机技术—控制理论与控制工程]