复合铁氰化镍膜电极分离溶液中Cs^+初步研究  

Research on Cs^+ Removal from Solution by Using Composite NiHCF Thin Film Electrode

作　　者：李永国[1] 丘丹圭[1] 侯建荣[1] 郝晓刚[2] 孔海霞[1] 史英霞[1] 

机构地区：[1]中国辐射防护研究院,太原030006 [2]太原理工大学化工学院,太原030024

出　　处：《辐射防护》2011年第4期209-214,共6页Radiation Protection

基　　金：国家自然科学基金资助项目(20676089)

摘　　要：在石墨-碳纤维-镍网复合多孔基体上通过毛细化学沉积法合成制备具有电控离子分离性能的铁氰化镍(Nickel Hexacyanoferrate,NiHCF)薄膜。采用循环伏安法(CV)考察了复合薄膜电极的离子交换容量、循环寿命、选择性与再生能力,并通过X射线能谱(Energy dispersive X-ray spectroscopy,EDS)分析了膜电极组成。实验结果表明:该复合NiHCF膜电极对Cs+具有良好的选择性、循环稳定性与再生能力;离子分离能力为80~100 mA/g、扩散阻力(氧化还原峰偏移)0.31 V。Nickel hexacyanoferrate （NiHCF） thin film electrode of graphite-fiber-Ni mesh composite substrate for electrochemically controlled ion separation （ECIS） was synthesized by capillary chemical deposition. The cyclic voltammetry （CV） was used to investigate the separation capacity, cycle life, selectivity and regeneability of NiHCF film electrode. The composition of the film was characterized by energy dispersive X ray spectroscopy （EDS）. Experimental results show that NiHCF thin film electrode with graphite-fiber-Ni mesh composite substrate has high selectivity for Cs ＋, good stability and regenerability. The separation capacity was 80-100 mA/g. The separation between the anodic and the cathodic peak potentials（diffusion resistance）was 0.31 V.

关 键 词：毛细化学沉积法 电控离子分离 NiHCF薄膜 循环伏安法 

分 类 号：O484.1[理学—固体物理]