有效线宽ΔH_(eff)和场移S的来源分析  

Origin of the Effective Linewidth ΔH_(eff)  and the Field Shift S

作　　者：韩志全[1] 

机构地区：[1]中国西南应用磁学研究所,绵阳621000

出　　处：《磁性材料及器件》1999年第5期1-5,22,共6页Journal of Magnetic Materials and Devices

摘　　要：考虑了晶粒表层中由杂质和应力引起的表面单轴各向异性场，计算表明非共振ΔＨｅｆｆ 源于晶粒表层的自旋波共振损耗χｓ＋ ＂ ，场移源于χｓ＋ － χｂ＋ 。理论与实验十分一致。In consideration of the existence of impuraty and strain induced uniaxial anisotropy field H s  in grain surface layers,it is shown by calculation,that the off resonance effective linewidth ΔH eff  arises from the loss of spin wave resonance excited in some grain surface layers,χ s + ' ,and the field shift S is referable to the difference between the real parts of susceptibility in grain surface layers and in the grain interior,χ s + -χ b +  .The theory agrees well with experiments.

关 键 词：微波铁氧体 铁磁共振 有效线宽 自旋波共振 

分 类 号：TM277[一般工业技术—材料科学与工程]