水热法制备不同形貌的氧化锌纳米结构  

Preparation of ZnO nanostructures with different morphologies by using hydrothermal method

作　　者：李琛[1] 周明[1] 沈坚[1] 

机构地区：[1]江苏大学江苏省光子制造科学技术重点实验室,江苏镇江202013

出　　处：《功能材料》2011年第7期1327-1331,共5页Journal of Functional Materials

基　　金：国家自然科学基金资助项目(50975129);江苏省科技支撑计划资助项目(BE2008110)

摘　　要：采用水热法,用甲酰胺水溶液和锌片建立反应体系,在不同种晶层上制备出不同形貌的ZnO纳米结构,所用基底有Si片、镀有ZnO薄膜的Si片、镀有ITO薄膜的Si片、涂有ZnO粉末的Si片等,研究了不同的种晶层对ZnO纳米结构的形貌的影响。在不同温度下,分别在镀有ZnO薄膜和ITO薄膜的医用载玻片衬底上生长ZnO纳米结构,研究了温度在水热法中的作用及种晶层对纳米杆长度的影响。实验中用扫描电子显微镜(SEM)和X射线衍射仪(XRD)对纳米聚集体进行了表征。SEM表征结果表明不同种晶层上获得的ZnO纳米结构形貌差异很大;反应时间、甲酰胺水溶液浓度以及反应温度对ZnO纳米阵列形貌都有着一定的影响;在ZnO薄膜上生长的纳米杆较在ITO薄膜上生长的纳米杆长。SEM图像同时表明氧化锌纳米杆随着温度的增大,纳米杆的长度和杆径增大。X射线衍射峰在34.6℃有很强的(002)纤锌矿衍射峰,该峰表明衬底上有高度c轴取向的大面积纳米杆阵列和较好的结晶质量。The hydrothermal method was developed here to prepare ZnO nano-structure with different morphology on different seed layer.The substrates include silicon wafer,silicon wafer deposited with ZnO thin film,silicon wafer deposited with ITO thin film,etc.We investigated the influence of different seed layer on the morphology of ZnO nano-structure.We also prepared ZnO nano-structure on ZnO seed layer and ITO seed layer under different temperature to study the influence of temperature and seed layer on the length of nano-rod.Scanning electron microscopy（SEM） and X-ray diffraction（XRD） were developed to characterize the samples.The results showed that seed layer,reaction time,growth temperature and methanamide concentration had a great influence on the morphology of nano-structure.Nano-rod formed on ITO seed layer is shorter than prepared on the ZnO seed layer.From the SEM picture it also would be seen that the diameter and length of nano-rod increased as temperature goes high.X-ray diffraction peak at 34.6℃ had a strong（002） wurtzite peaks,which showed a high degree of c-axis oriented nanorod arrays and good crystalline quality.

关 键 词：纳米杆 ZNO ITO 水热法 

分 类 号：TB34[一般工业技术—材料科学与工程]