ω扫描和φ扫描在薄膜结构表征中的应用  

Application of ω Scan and φ Scan in the Characterization of the Structure of Thin Films

作　　者：秦冬阳[1,2] 卢亚锋[2] 张孔[3] 刘茜[3] 周廉[2] 

机构地区：[1]西安交通大学金属材料强度国家重点实验室,西安710049 [2]西北有色金属研究院,西安710016 [3]中国科学院上海硅酸盐研究所高性能陶瓷和超微结构国家重点实验室,上海200050

出　　处：《材料导报》2011年第14期125-128,共4页Materials Reports

基　　金：国家科技支撑计划课题(2007BAE07B01)

摘　　要：X射线衍射作为一种无损检测手段已经广泛应用于薄膜材料的结构分析和相分析。ω扫描和φ扫描都基于布拉格方程,可以对薄膜材料丝织构和面内织构进行表征。着重阐述了这两种扫描方式的X射线衍射几何、相关原理和在X射线四圆衍射仪实验过程中的实验参数设置,并介绍了它们的适用范围。最后列举了两种方法在金属薄膜、氧化物薄膜和半导体薄膜结构分析中的应用,显示出这两种表征手段在薄膜结构表征中的优势。X-ray diffraction which is considered as an nondestructive examination technique has been widely used in the characterization of the structure of thin films. Based on the Bragg equation, ω scan and Ф scan are applicable for analyzing the fiber texture and in-plane texture of the thin films. Diffraction geometry, principle as well as the experimental setup in the four-circle diffractometer were underlined. The widespread application of both methods in metal thin films, oxide thin films and semiconductor films shows the advantage of the ω scan and Ф scan in the film structure analysis.

关 键 词：ω扫描 φ扫描 薄膜 织构 

分 类 号：O722.2[理学—晶体学]