氧化物晶体与薄膜最新研究进展(英文)  

Research Progress on Oxide Crystals and Thin Films

作　　者：木村秀夫 赵洪阳 姚启文 程振祥[2] 王小林[2] 

机构地区：[1]日本国立物质材料研究机构,筑波3050047 [2]澳大利亚卧龙岗大学电子材料研究所,新南威尔士州2519

出　　处：《人工晶体学报》2011年第3期789-795,共7页Journal of Synthetic Crystals

基　　金：Project supported by grants fromJSPS Grant-in-Aid for Scientific Research(C)(21605012);Grant-in-Aid for JSPS Fellows(21-09608 and 22-00796);JSPS and ARC under Japan-Australia Research Cooperative Program

摘　　要：在工业发展的进程中,氧化物材料在电子学领域中应用最为广泛。到目前为止,即使是对于氧化物晶体材料,从纳米科技角度来说,研究的趋势是降低尺寸直到很小的尺度。近年来,氧化物的研究目标也发生了显著的变化。本文介绍了作者课题组的与氧化物晶体及薄膜有关的三个研究方向。Oxide materials are most popular in electronics field from the industrial revolutions.Up to the present,research trend is down sizing to a small scale even in oxide crystals from the viewpoint of nanotechnology.Research target is also changed dramatically for several years.Here author＇s three research topics that related to oxide bulk single crystals and thin films are introduced.

关 键 词：体晶体 薄膜 压电性 铁电性 多铁性 光催化 

分 类 号：TN304.053[电子电信—物理电子学]