High frequency performance of nano-scale ultra-thin-body Schottky-barrier n-MOSFETs  被引量:1

High frequency performance of nano-scale ultra-thin-body Schottky-barrier n-MOSFETs

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作  者:DU Gang LIU XiaoYan HAN RuQi 

机构地区:[1]Institute of Microelectronics,Peking University,Beijing 100871,China

出  处:《Science China(Information Sciences)》2011年第8期1756-1761,共6页中国科学(信息科学)(英文版)

基  金:supported Supported by the National Natural Science Foundation of China(Grant No.60606013);NKBRP 2006CB302705

摘  要:The high frequency performances of nano-scale ultra-thin-body (UTB) Schottky-barrier n-MOSFETs (SB-nMOSFETs) are investigated using 2D full-band self-consistent ensemble Monte Carlo method. The UTB SB-nMOSFET devices offer excellent RF performance with high values of f T and f max.The significant dependence of f T and f max on gate voltage and weak dependence on barrier height are demonstrated.Meanwhile,the significant dependence of g m and g ds on both gate voltage and SB height are shown. Moreover,the scalability of f T is outstanding and close to the ideal case (f T ∝ 1/L2g ). The high frequency performances of 45 nm channel length SB-nMOSFETs at ballistic transport limit are also investigated. Results show that scattering strongly affects the capacitances C gs,C gd and C ds.At ballistic transport limit the f T and f max are almost 10 times larger.The Scattering effects in nano-scale SB-nMOSFETs cannot be neglected.The high frequency performances of nano-scale ultra-thin-body (UTB) Schottky-barrier n-MOSFETs (SB-nMOSFETs) are investigated using 2D full-band self-consistent ensemble Monte Carlo method. The UTB SB-nMOSFET devices offer excellent RF performance with high values of f T and f max.The significant dependence of f T and f max on gate voltage and weak dependence on barrier height are demonstrated.Meanwhile,the significant dependence of g m and g ds on both gate voltage and SB height are shown. Moreover,the scalability of f T is outstanding and close to the ideal case (f T ∝ 1/L2g ). The high frequency performances of 45 nm channel length SB-nMOSFETs at ballistic transport limit are also investigated. Results show that scattering strongly affects the capacitances C gs,C gd and C ds.At ballistic transport limit the f T and f max are almost 10 times larger.The Scattering effects in nano-scale SB-nMOSFETs cannot be neglected.

关 键 词:Monte Carlo ultra thin body (UTB) Schottky-barrier MOSFETs (SB-MOSFETs) high frequency 

分 类 号:TN386.1[电子电信—物理电子学] TN311.7

 

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