高功率脉冲磁控放电等离子体注入与沉积CrN薄膜研究  

Growth of CrN Films by Plasma Ion Implantation & Deposition Based on High Power Pulsed Magnetron Discharge

作　　者：吴忠振[1] 田修波[1] 王泽明[1] 巩春志[1] 杨士勤[1] 

机构地区：[1]哈尔滨工业大学现代焊接与连接国家重点实验实,哈尔滨150001

出　　处：《真空科学与技术学报》2011年第4期459-464,共6页Chinese Journal of Vacuum Science and Technology

基　　金：国家自然科学基金资助项目(10775036和50373007);新世纪优秀人才计划资助项目

摘　　要：采用高功率脉冲磁控放电等离子体离子注入与沉积的方法在不锈钢基体上制备了高膜基结合力的CrN硬质薄膜,并研究了不同的Ar/N流量比对薄膜形貌、结构及性能的影响。采用扫描电子显微镜、X射线衍射对其表面形貌和结构进行分析,发现制备的薄膜表面光滑、致密,相结构单一,主要是CrN（200）相。对薄膜的结合力、硬度、弹性模量、耐磨性和耐腐蚀性的测试分析表明：薄膜与基体之间有很好的结合力,临界载荷最高可达68 N,同时硬度、弹性模量、耐磨性及耐腐蚀性都有很大提高,其中硬度最高达到23.6 GPa,是基体硬度的4.7倍,摩擦系数为0.5左右,且磨痕较窄、较浅,腐蚀电位最高提高0.32 V,腐蚀电流下降12个数量级。The CrN films were grown by high power pulsed magnetron discharge plasma ion implantation deposition on stainless steel substrates.The impacts of the deposition conditions,especially the gas flow-rate ratio of argon and nitrogen,on the CrN films were studied.Its microstructures and mechanical properties were characterized with X-ray diffraction,scanning electron microscopy and conventional mechanical probes.The results show that the smooth,compact CrN films with strong interface adhesion significantly improve the mechanical properties of the substrates.For instance,the highest critical load in evaluating the interfacial adhesion was 68 N;the hardness increased to 23.6 GPa,4.7 times of the substrates.Moreover,the CrN coated surfaces display lower friction coefficient,0.5,but higher wear resistance than the control sample.The corrosion potential increases by 0.32 V,but the corrosion current decreases by an order of magnitude.

关 键 词：高功率脉冲磁控放电 等离子体离子注入与沉积 氮化铬 微观结构 表面性能 

分 类 号：TG174.444[金属学及工艺—金属表面处理]