方管内表面等离子体离子注入动力学GPU-PIC仿真  

Dynamical Simulation of Modification of Inner Surfaces of Square Tubes by Plasma Ion Implantation

作　　者：汪志健[1] 田修波[1] 巩春志[1] 杨士勤[1] Ricky Fu 

机构地区：[1]哈尔滨工业大学现代焊接生产技术国家重点实验室,哈尔滨150001 [2]Department of Physics&Materials Science,City University of Hong Kong,Hongkong,China

出　　处：《真空科学与技术学报》2011年第4期470-475,共6页Chinese Journal of Vacuum Science and Technology

基　　金：国家自然科学基金资助项目(10775036,10905013,10975041)

摘　　要：内表面改性近年日益受到人们重视。本文采用基于Graphic Processing Unit(GPU)的Particle-in-cell(PIC)模型对方形管内表面的离子注入动力学过程进行数值仿真研究。结果表明在注入过程中,辅助地电极周围形成离子空穴,随时间延长,离子空穴发生交联并不断扩展,直至所有离子注入到方管内壁。离子空穴的形成和扩展使得在管内部形成离子密度波,密度波的传播速度随时间增加。由于等离子体鞘层的不均匀重叠使得管内的初始鞘层厚度分布不均,其中位于拐角附近的鞘层较厚,从而又导致了方管内壁周向上的注入剂量和能量分布存在不均匀性,内壁平面附近位置的注入剂量和注入能量均相对较大,而拐角附近的离子注入剂量和能量最小。本文采用GPU加速PIC的算法取得了高达90的加速比,极大缩短了等离子体粒子模拟的计算时间。The modification of the inner surfaces of the square tube by plasma ion implantation was dynamically simulated with two-dimensional particle-in-cell（PIC） model,based on graphic processing unit（GPU）.The simulated results show that in the plasma ion implantation,first,the exhaustion of the ions begins around the auxiliary electrode after the sheath hits the grounded rod;then,the localized field drives the ions to the square tube,leaving ion-holes near the grounded rod,until the depletion of all ions in the tube.The formation of ion density wave,propagating at a velocity increased with time can be specified.Depending on the overlapping extents,the sheath thickness varies greatly,leading to non-uniform distributions of both the energy and dosage of the implanted ion on the inner walls of the square tube.For example,the energy and dosage of the implanted ions on the fairly flat surface were higher than those at or near the sharp corners.The original work in this simulation was that application of GPU technique significantly accelerates the PIC simulation,and reduces the computation time.

关 键 词：等离子体离子注入 粒子模拟 GPU 均匀性 注入能量 

分 类 号：TL612.3[核科学技术—核技术及应用]