脉冲磁场致非晶合金纳米晶化及巨磁阻抗研究  被引量:1

Study of Amorphous Alloy Nano-crystallization and Giant Magnetic Impedance by Pulsing Magnetic Field

在线阅读下载全文

作  者:郭红[1,2] 晁月盛[1] 金莹[2] 

机构地区:[1]东北大学,辽宁沈阳110004 [2]辽宁石油化工大学,辽宁抚顺113001

出  处:《稀有金属材料与工程》2011年第7期1163-1167,共5页Rare Metal Materials and Engineering

基  金:高等教育博士专项基金(20020145009)

摘  要:对Co68.15Fe4.35Si12.5B15非晶合金薄带进行低频脉冲磁场处理,Mssbauer谱分析及透射电镜(TEM)观察结果表明,样品发生了初始纳米晶化,晶化量与磁脉冲强度有关。采用巨磁阻抗(简称GMI)测量仪测量样品GMI,结果显示GMI与脉冲磁场强度HP呈非单调变化规律,HP为350kA·m-1时样品具有最大GMI,其值为263.5%。磁脉冲在样品内感生的横向各向异性对GMI效应产生影响,当外加直流磁场Hex等于感生磁各向异性场Hk时,GMI出现峰值。Amorphous Co68.15Fe4.35Si12.5B15 alloy ribbons were treated by low-frequency pulsing magnetic field.Mssbauer spectroscopy and TEM observation show that initial nano-crystallization of the amorphous samples occurs,and the volume fraction of crystallized phase has a relation with pulsing magnetic field intensity.The giant magnetic impedance(GMI) of the samples were tested by a GMI instrument;the results show a non-monotonic change between GMI and pulsing magnetic field intensity HP,and the GMI reaches the greatest value of 263.5% under the magnetic field intensity HP=350 kA·m-1.The transverse anisotropy induced by pulsing magnetic field in specimens affects the GMI effect.When the external dc current magnetic filed Hex is equal to Hk,GMI reaches the peak value.

关 键 词:低频脉冲磁场 非晶合金纳米晶化 巨磁阻抗效应 

分 类 号:TG139.8[一般工业技术—材料科学与工程]

 

参考文献:

正在载入数据...

 

二级参考文献:

正在载入数据...

 

耦合文献:

正在载入数据...

 

引证文献:

正在载入数据...

 

二级引证文献:

正在载入数据...

 

同被引文献:

正在载入数据...

 

相关期刊文献:

正在载入数据...

相关的主题
相关的作者对象
相关的机构对象