一种ICP-MS真空测量系统的研制  

Development of a vacuum measurement system for ICP-MS

作　　者：李明[1] 陈永彦[1] 类成华[1] 杨雷岗[1] 

机构地区：[1]钢铁研究总院分析测试所,北京100081

出　　处：《真空》2011年第4期40-42,共3页Vacuum

摘　　要：本文介绍了一种基于C8051F微控制器并应用于电感耦合等离子体质谱仪(ICP-MS)的真空测量系统。系统由真空计组、预处理电路、C8051F微控制器、串行接口和上位机组成,能同时测量接口、透镜和四级杆三个部分的真空状态,且具有较高的集成度,紧凑的体积和较低的功耗,经最后实验证实,系统能准确且稳定的测量各个部分的真空度,可为ICP-MS的正常工作提供相应的条件保障。A vacuum measurement system based on C8051F microcontroller applied to inductively coupled plasma mass spectrometry （ICP-MS） was introduced. The system consists of vacuum gauge group, pre-processing circuit, C8051F microcontroller, serial interface and computer, which can measure the vacuum degree of the interface, lens and quadrupole simultaneously with high integration, compact volume and lower power consumption. By practical test, it proves that this system can measure accurately and stably which provides guarantee for the normal work of ICP-MS.

关 键 词：真空测量:电感耦合等离子体质谱仪 C8051F微控制器 实时测量 

分 类 号：TB771[一般工业技术—真空技术]