铜蒸气激光器扩散系数的研究  

Study of Diffusion Coefficient in Copper-vapor Laser

作　　者：于德利[1] 陶永祥[1] 尹宪华[1] 王润文[1] 

机构地区：[1]中国科学院上海光机所,上海201800

出　　处：《中国激光》1999年第12期1057-1060,共4页Chinese Journal of Lasers

摘　　要：推导了铜蒸气激光器带电粒子的双极扩散系数。结合铜蒸气激光器动力学模型对铜蒸气激光器动力学过程中的铜亚稳态粒子热扩散去激发及带电粒子双极扩散进行了分析。定量地给出了粒子热扩散项对铜亚稳态粒子密度及电子的双极扩散对电子密度的影响。The ambipolar diffusion coefficient of charged copper species in copper vapor laser is theoretically deduced. On the base of the copper vapor laser kinetic model the thermal diffusion coefficient for the metastable copper species and the ambipolar diffusion coefficient for electrons are analyzed. The influence of thermal diffusion on metastable copper density and the ambipolar diffusion on electron density is quantitatively analyzed.

关 键 词：铜亚稳态粒子 铜蒸气激光器 扩散系统 

分 类 号：TN248.21[电子电信—物理电子学]