羧基负离子型聚电解质与重氮树脂的自组装及自组装膜的光和热反应  

THE SELF\|ASSEMBLY FILMS FROM DIAZORESIN AND CARBOXY\|CONTAINING POLYELECTROLYTES AND THEIR PHOTO\| AND THERMAL REACTIONS

作　　者：罗皡 陈金玉[1] 罗国斌[1] 陈燕宁 曹维孝[1] 

机构地区：[1]北京大学化学学院,北京100871

出　　处：《高分子学报》1999年第6期770-773,共4页Acta Polymerica Sinica

基　　金：国家自然科学基金

摘　　要：The multilayer films from diazoresin (DR) and poly(sodium acrylate, PANa) or alkali hydrolytic maleic anhydride/styrene copolymer (PMSNa) were fabricated on mica. During the fabrication process the absorbance increases about 0\^033 for every fabrication cycle, indicating that the thickness of the film increases regularly. Under irradiation of UV light or heating, following the -N\-2\++ decomposition, the inoic bond of the film converts to covalent bond. The morphologies of the film after DMF etching for the different films (irradiatied or unirradiated etc) were observed by Atomic Force Microscopy (AFM) and the result shows that the ability of the film against etching from polar solvent increases obviously. The conversion of bond nature from ionic to covalent was verified preliminarily by FTIR spectral analysis.The multilayer films from diazoresin (DR) and poly(sodium acrylate, PANa) or alkali hydrolytic maleic anhydride/styrene copolymer (PMSNa) were fabricated on mica. During the fabrication process the absorbance increases about 0\^033 for every fabrication cycle, indicating that the thickness of the film increases regularly. Under irradiation of UV light or heating, following the -N\-2\++ decomposition, the inoic bond of the film converts to covalent bond. The morphologies of the film after DMF etching for the different films (irradiatied or unirradiated etc) were observed by Atomic Force Microscopy (AFM) and the result shows that the ability of the film against etching from polar solvent increases obviously. The conversion of bond nature from ionic to covalent was verified preliminarily by FTIR spectral analysis.

关 键 词：羧基负离子 重氮树脂 负离子 聚电解质 自组装膜 

分 类 号：O631.2[理学—高分子化学]