硅锑钼三元杂多酸光化学光度法测定痕量硅  

Photochemical Spectrophotometric Determination of Trace Amounts of Si with Si-Sb-Mo Ternary Heteropoly Acid

作　　者：李廷盛[1] 蒋治良[1] 

机构地区：[1]广西师范大学计算分析测试中心,桂林541004

出　　处：《分析科学学报》1999年第6期488-491,共4页Journal of Analytical Science

摘　　要：在 0 .0 3mol L HCl 8%甲醇介质中 ,Si( )、Sb( )、Mo( )形成三元杂多酸 ,再将 HCl浓度调至 0 .4 3mol L,用紫外光照射后生成 Si Sb Mo三元杂多蓝 ( λmax=760nm)。据此建立了一个测定 0 .0 6～ 1 .0 μg m L Si的光化学分光光度分析新方法。该法具有灵敏度高 ,选择性好 ,操作简便等特点。A new photochemical spectrophotometric method for the determination of 0.06 ～1.0 μg/mL Si has been described. Si(Ⅳ), Sb(Ⅲ) and Mo(Ⅵ) formed a ternary heteropoly acid in the conditions of 0.03 mol/L HCl and 8% methanol. And the ternary heteropoly acid was reduced to form its ternary heteropoly blue under ultraviolet light in the medium of 0.43 mol/L HCl with the maximum absorbance at 760 nm. This method had the characteristics of high sensitivity, good selectivity and easy operation.

关 键 词：硅锑钼 硅 三元杂多酸 光化学光度分析 

分 类 号：O613.72[理学—无机化学]