Optical, Mechanical and Laser-induced Damage Threshold Properties of 1064 nm, 532 nm Frequency-doubled Antireflection Coating for LBO  

作　　者：谭天亚 

机构地区：[1]Department of Physics, Liaoning University

出　　处：《Journal of Wuhan University of Technology(Materials Science)》2011年第4期687-689,共3页武汉理工大学学报（材料科学英文版）

基　　金：Funded by the Doctorial Start-up Fund of the Department of Science and Technology of Liaoning Province (20081030)

摘　　要：1 064 nm, 532 nm frequency-doubled antireflection （AR） coatings with buffer layer of SiO2 between the coating and the substrate were fabricated by the electron beam evaporation technology on the substrate of lithium triborate （LiB3O5 or LBO） crystals. The residual reflectance of the sample is 0.07% and 0.11% at 1 064 nm and 532 nm, respectively. The adhesion and the laser-induced damage threshold （LIDT） of the sample are greater than 200 mN and 18.6 J/cm2. The strengthening mechanism of adhesion and LIDT of the buffer layer of SiO2 were discussed by considering full plastic indentation and shear theory, and spallation of a plated film induced by thermal shock stress, respectively.1 064 nm, 532 nm frequency-doubled antireflection （AR） coatings with buffer layer of SiO2 between the coating and the substrate were fabricated by the electron beam evaporation technology on the substrate of lithium triborate （LiB3O5 or LBO） crystals. The residual reflectance of the sample is 0.07% and 0.11% at 1 064 nm and 532 nm, respectively. The adhesion and the laser-induced damage threshold （LIDT） of the sample are greater than 200 mN and 18.6 J/cm2. The strengthening mechanism of adhesion and LIDT of the buffer layer of SiO2 were discussed by considering full plastic indentation and shear theory, and spallation of a plated film induced by thermal shock stress, respectively.

关 键 词：frequency-doubled AR coating LBO ADHESION LIDT buffer layer 

分 类 号：TG174.4[金属学及工艺—金属表面处理]