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作 者:易于[1] 周泽华[1] 王泽华[1] 江少群[1] 赵伟华[1]
出 处:《机械工程材料》2011年第8期55-57,61,共4页Materials For Mechanical Engineering
基 金:国家自然科学基金重大项目(59995440)之子项资助项目;中央高校基本科研业务费资助项目(2009B15914)
摘 要:采用双辊连铸工艺制备了硅的质量分数分别为0.5%,1.0%,3.0%,4.5%的硅钢薄带,用光学显微镜观察其组织,并研究了后处理工艺对薄带组织和性能的影响。结果表明:硅含量为0.5%和1.0%的薄带适合采用一次冷轧+850~950℃退火的后处理工艺,而硅含量在3.0%以上的薄带适合采用二次冷轧+950℃退火的后处理工艺;硅含量为3.0%和4.5%的薄带在冷轧并950℃退火后,其磁性能最佳,铁芯损耗约为4.30 W·kg^(-1),磁感应强度约为1.68T。Silicon steel thin strips with silicon content of 0. 5wt%, 1.0wt%, 3. 0wt% and 4. 5wt% were prepared by twin-roll continuous casting process, and the microstructure of the strips were observed by means of optical microscopy, and on the basis, the effect of post-treatment process on microstructure and properties of the strips was studied. The results show that the post-treatment process of one-time cold rolling and annealing between 850-950 ℃ was suitable for the strips with silicon content of 0. 5wt% and 1.0wt% but the two-times cold roll and annealing at 950℃ was a suitable post-treatment process for the strips with above 3.0wt% silicon. The magnetism properties of the thin strip with silicon content of 3. 0wt% and 4. 5wt% annealed at 950℃ after cold rolling was best, the core loss was about 4. 30 W · kg^-1 and magnetic induction was about 1.68 T.
分 类 号:TG113.12[金属学及工艺—物理冶金]
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