电阻阵列非均匀性测试方法研究  

A Non-uniformity Measurement Method for Resistor Arrays

作　　者：杨春伟[1] 王仕成[1] 苏德伦[1] 廖守亿[1] 张金生[1] 

机构地区：[1]第二炮兵工程学院301教研室,陕西西安710025

出　　处：《红外》2011年第8期12-17,共6页Infrared

基　　金：航空科学基金(20080112005)

摘　　要：给出了电阻阵列非均匀性校正方法,并根据非均匀性测试模型分析了1:1映射下的非均匀性全屏测试方法。针对图像退化会导致边缘效应以及收敛性变差的问题,研究了基于点扩散函数估计的全屏测试方法。仿真结果表明,与原方法相比,该方法可以减少边缘效应的影响,并且在平滑因子较大时可以体现出更好的收敛性。A non-uniformity correction method for resistor arrays is given and a flood non-uniformity measurement method in the mapping ratio 1：1 is analyzed according to the functional diagram of a non-uniformity measurement model.To improve the edge effect and non-ideal convergence due to image deterioration,a flood non-uniformity measurement method based on point spread function estimation is proposed.The simulation result shows that compared with the former method,this method can reduce the edge effect and has a better convergence when a greater smooth factor is existent.

关 键 词：电阻阵列 非均匀性校正 稀疏网格法 全屏测试法 点扩散函数 

分 类 号：TN219[电子电信—物理电子学]