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作 者:叶芸[1] 郭太良[1] 蒋亚东[2] 黎威志[2]
机构地区:[1]福州大学物理与信息工程学院,福州350002 [2]电子科技大学电子薄膜与集成器件国家重点实验室,成都610054
出 处:《材料研究学报》2011年第4期403-407,共5页Chinese Journal of Materials Research
基 金:国家杰出青年基金60425101;电子薄膜与集成器件国家重点实验室开发课题KFJJ200916;福建省科技厅2009J05145资助项目~~
摘 要:用高分辨率X-射线光电子能谱(XPS)研究了热极化和电晕极化的PVDF薄膜的成分和结构的变化。结果表明:PVDF薄膜的热极化和电晕极化反应过程和机理不同。在热极化过程中.高温强电场作用使PVDF薄膜产生了少量的F^-自由基,继而产生HF,形成了新C=C键:怛是,在电晕极化过程中荷能粒子使PVDF产生了H^+自由基。热极化PVDF薄膜的剩余极化值约为3.5μC/cm^2,电晕极化PVDF薄膜的剩余极化值约为3.0μC/cm^2。The component and structure of thermally poled and corona charged PVDF films were investigated by the aid of high-resolution X-ray photoelectron spectroscopy(XPS).The results of XPS and ferroelectric properties show that the reaction and mechanism of thermally poling and corona charging for PVDF films was distinct.With the effect of high electric field at high temperature in thermally poling, a new carbon couple bond was created through the action of HF which was produced by F^- radicals. However,the H~+ radicals engendered due to bombardment of particles during corona charging.And the remanent polarization of thermally poled PVDF film is about 3.5μC/cm^2,while that of corona charged PVDF film is about 3.0μC/cm^2.
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