多功能基共改性聚甲基三氟丙基硅氧烷的合成表征与膜形貌  

Synthesis,Characterization and Film Morphology of Multifunctional Group co-Modified Polymethyltrifluoropropylsiloxane

作　　者：许伟[1] 安秋凤[1,2] 郝丽芬[1] 王前进[1] 

机构地区：[1]陕西科技大学教育部轻化工助剂化学与技术重点实验室,陕西西安710021 [2]浙江温州轻工研究院,浙江温州325003

出　　处：《高分子材料科学与工程》2011年第7期13-16,共4页Polymer Materials Science & Engineering

基　　金：浙江省重大科技专项(优先主题)工业项目(2008C11113);陕西省教育厅自然科学计划项目(2010JK442);陕西科技大学自然科学基金项目(ZX09-10)

摘　　要：通过聚甲基三氟丙基含氢硅氧烷与端烯丙基聚氧乙烯醚、丙烯酸十八醇酯、烯丙基缩水甘油醚的硅氢化加成反应,制备了一种十八酯基/聚醚/环氧基共改性聚甲基三氟丙基硅氧烷(PSA-PFMS)。用红外光谱(FT-IR)、核磁共振氢谱(1H-NMR)、场发射扫描电镜(FESEM)、原子力显微镜(AFM)等仪器分别对PSA-PFMS的结构、成膜形态及性能进行表征和研究。结果表明,在棉纤维和单晶硅表面,PSA-PFMS均可成膜。在单晶硅表面,可形成粗糙度大(2μm×2μm的扫描范围内,硅膜的均方粗糙度达1.197 nm)、呈微观相分离结构的疏水膜。该膜附着在纤维表面,能使处理后织物表面水的静态接触角达到129.2°。A novel co-modified polymethyltrifluoropropylsiloxane grafted by a series of allylpolyoxyethylene ether,stearyl alcohol acrylic ester and allylglyeidyl ether（PSA-PFMS）,was synthesized by Si-H additional reaction.Chemical structure of PSA-PFMS was characterized by infrared spectrum（IR） and proton nuclear magnetic resonance（1H-NMR）.Film morphology of PSA-PFMS on silicon wafer and cotton fiber substrates were observed by atomic force microscope（AFM） and field emission scanning electron microscopy（FESEM）,respectively.Results show that PSA-PFMS can form a hydrophobic polysiloxane film on both fiber and silicon wafer surfaces.PSA-PFMS film possesses quite higher roughness and phase-separated morphology in its AFM images under microanalysis（Rq,1.197 nm within the scanning 2 μm×2 μm areas）.Contact angle of water on cotton fabrics treated by PSA-PFMS can reach to 129.2°.

关 键 词：改性聚甲基三氟丙基硅氧烷 膜形貌 疏水性 棉织物 

分 类 号：TQ316.6[化学工程—高聚物工业]