室温常压溶液法合成烯丙基功能化的正六边形硅纳米晶体  

Synthesis of hexagonal silicon nanocrystals under ambient condition

作　　者：王晶[1] 孙树清[1,2] 

机构地区：[1]国家纳米科学中心,北京100190 [2]清华大学深圳研究生院,深圳518055

出　　处：《中国科学：物理学、力学、天文学》2011年第9期1041-1045,共5页Scientia Sinica Physica,Mechanica & Astronomica

基　　金：国家自然科学基金(批准号:20673030;20971030;90923007);国家重点基础研究发展计划(编号:2009CB930700)资助项目

摘　　要：室温常压下,以氢化铝锂为还原剂在溶液中还原烯丙基三氯硅烷和四氯化硅体系,制备了烯丙基功能基团修饰的正六边形硅单晶.采用透射电子显微镜（Transmission Electron Microscopy,TEM）和傅里叶变换红外光谱（Fourier Transform Infrared,FTIR）对产物进行表征.研究了硅晶体的尺寸分布、晶面取向及表面组成,推测了可能的反应机理.结果表明,三氯硅烷与四氯化硅浓度比为1：3时经过还原可生成尺寸为20~50nm,表面有烯丙基基团的（111）晶向的单晶硅.Hexagonal silicon nanocrystals modified with allyl were prepared under ambient condition via the co-reduction of allyl trichlorosilane and silicon tetrachloride using LiAlH4.The size,size distribution and crystal orientation were investigated by transmission electron microscopy.Their surface chemistry was characterized using Fourier transform infrared spectroscopy and the possible mechanism of the nanocrystal formation was discussed.The result indicated that silicon nanocrystals functionalized with allyl with size range from 20-50 nm can be formed when the ratio of allyl trichlorosilane and silicon tetrachloride was set to 1：3.

关 键 词：纳米晶体 晶体硅 表面修饰 

分 类 号：TB383.1[一般工业技术—材料科学与工程]