采用环摆抛的双面抛光技术  

Technique of double-sided polishing based on ring-pendulum polishing

作　　者：何曼泽[1] 王琳[1] 周佩璠[1] 杨李茗[1] 

机构地区：[1]成都精密光学工程研究中心,四川成都610041

出　　处：《红外与激光工程》2011年第8期1526-1529,共4页Infrared and Laser Engineering

基　　金：国家自然科学基金(60672154)

摘　　要：针对大口径方形超薄光学元件的抛光,提出一种新型的基于环摆抛的双面抛光方法,该方法将环形抛光和钟摆式抛光的运动方式和加工机理耦合起来,使其具备同步控制大口径方形超薄光学元件透射波前和反射面形的特点。从理论上介绍了该方法的抛光原理,利用研制的双面抛光原理样机,通过实验验证了对大口径超薄光学元件的面形修正能力,证实了这种双面抛光方法的可行性。该方法在控制大口径超薄光学元件的透射波前和反射面形上具有显著的效果。In connection with polishing the ultra-thin large-aperture square optics, a new type of doubleside polishing method was introduced. It coupled the function of ring polishing and pendulum polishing with the mechanism and processing, making it simultaneously control transmission wavefront and reflecting surface shape of ultra-thin large-aperture square optics. The polishing principle of this method was introduced in theory. With the designed prototype, experimental results validate its capacity of modifying the surface shape of ultra-thin large-aperture components. Feasibility of this double-side polishing has been confirmed. This technique has siginificant effect on controlling transmission wavefront and reflecting surface shape of ultra-thin large-aperture components.

关 键 词：双面抛光 超薄光学元件 透射波前 反射面形 

分 类 号：TB133[机械工程—光学工程]