Epoxy replication of hard X-ray supermirrors  

作　　者：王芳芳 李文斌 黄秋实 朱京涛 穆宝忠 王占山 

机构地区：[1]Institute of Precision Optical Engineering,Department of Physics,Tongji University

出　　处：《Chinese Optics Letters》2011年第9期57-59,共3页中国光学快报（英文版）

基　　金：supported by the National Natural Science Foundation of China (Nos. 10773007 and 10978002);the National International Cooperation Program between China and Japan (No. 2008DFA01920)

摘　　要：The direct replication of W/Si supermirrors is investigated systematically. W/Si supermirrors are fabricated by direct current （DC） magnetron sputtering technology. After deposition, the supermirrors are replicated from the supersmooth mandrels onto ordinary float glass substrates by epoxy replication technique. The properties of the supermirrors before and after the replication are characterized by grazing incidence X-ray reflectometry （GIXR） measurement and atomic force microscope （AFM）. The results show that before and after replication, the multilayer structures are almost the same and that the surface roughness is 0.240 and 0.217 nm, respectively, which are close to that of the mandrel. It is demonstrated that the W/Si suDermirrors are successfully replicated from the mandrel with good performance.The direct replication of W/Si supermirrors is investigated systematically. W/Si supermirrors are fabricated by direct current （DC） magnetron sputtering technology. After deposition, the supermirrors are replicated from the supersmooth mandrels onto ordinary float glass substrates by epoxy replication technique. The properties of the supermirrors before and after the replication are characterized by grazing incidence X-ray reflectometry （GIXR） measurement and atomic force microscope （AFM）. The results show that before and after replication, the multilayer structures are almost the same and that the surface roughness is 0.240 and 0.217 nm, respectively, which are close to that of the mandrel. It is demonstrated that the W/Si suDermirrors are successfully replicated from the mandrel with good performance.

关 键 词：Atomic force microscopy SUBSTRATES Surface roughness 

分 类 号：TH743[机械工程—光学工程]