微构造硅表面形貌的陷光特性研究  

Light trapping characteristics of microstructured silicon surface morphology

作　　者：何慧丽[1] 陈长水[1] 王芳[1] 刘颂豪[1] 

机构地区：[1]华南师范大学光子纳米生物技术研究中心,广东广州510631

出　　处：《量子电子学报》2011年第5期617-621,共5页Chinese Journal of Quantum Electronics

基　　金：国家自然基金项目(60878063);广东省自然基金重点项目(10251063101000001;8251063101000006)

摘　　要：在特定的气体氛围下,用一定能量密度的飞秒激光连续照射单晶硅片表面,可制备出表面具有准规则排列微米量级锥形尖峰结构的黑硅材料。利用几何光学中光的传输理论,研究了黑硅材料的陷光特性,以及黑硅表面准规则排列的微米量级锥形尖峰结构的形状和密度对反射次数的影响。得到黑硅的表面准规则排列的微米量级锥形尖峰结构的高度越高、间距越小和底角越大,它的陷光效果就越好的结论。The material black silicon formed by arrays of sharp conical spikes on the silicon surface was fabricated under the cumulative femtosecond laser pulses irradiation in different ambient atmospheres. Using light transmission theory of geometrical optics, the light trapping properties of black silicon and effect of the micron cone-shaped peaks structure shape and density of black silicon surface on the number of reflections were studied. Then a conclusion is drawn from the black silicon surface structure, the higher height, the smaller distance and the greater bottom corner, the better its light trapping effect.

关 键 词：激光技术 黑硅 陷光特性 飞秒激光 

分 类 号：TN249[电子电信—物理电子学] O613.72[理学—无机化学]