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作 者:Zhongping He Yanlin He YiGao Lin Li Shuigen Huang Omer Van der Blest
机构地区:[1]School of Materials Science and Engineering, Shanghai University, Shanghai 200072, China [2]Cold Rolling Plant of Ansteel, Anshan 114021, China [3]Department of Metallurgy and Materials Engineering, Katholieke Universiteit Leuven, Kasteelpark Arenberg 44, B-3001 Heverlee, Belgium
出 处:《Journal of Materials Science & Technology》2011年第8期729-734,共6页材料科学技术(英文版)
基 金:supported by the National Natural Science Foundation of China under Grant Nos. 50971137 and 50934011;the National Basic Research program of China under GrantNo. 2010CB630802.
摘 要:DifFusion couples, Fe-6.8 wt% Al-1.0 wt% Si/Fe and Fe-6.3 wt% Al-0.9 wt% Si/Fe were constructed and separately annealed at 1050℃ for 3 h and at 1000℃ for 64 h. The concentration profiles of Fe, Al and Si atoms in these couples were measured by electron probe micro-analysis (EPMA), while the diffusion behavior was also simulated by coupling thermodynamic and kinetic properties of Fe-Al-Si system. The simulation results were in good agreement with the measured concentration profiles showing the validity of dynamic parameters of Fe-Al-Si system, Calculation was made for Fe-7 wt% Al-1 wt% Si/Fe diffusion couples at 1000℃ with different diffusion time. Silicon uphill was found under the influence of aluminum.DifFusion couples, Fe-6.8 wt% Al-1.0 wt% Si/Fe and Fe-6.3 wt% Al-0.9 wt% Si/Fe were constructed and separately annealed at 1050℃ for 3 h and at 1000℃ for 64 h. The concentration profiles of Fe, Al and Si atoms in these couples were measured by electron probe micro-analysis (EPMA), while the diffusion behavior was also simulated by coupling thermodynamic and kinetic properties of Fe-Al-Si system. The simulation results were in good agreement with the measured concentration profiles showing the validity of dynamic parameters of Fe-Al-Si system, Calculation was made for Fe-7 wt% Al-1 wt% Si/Fe diffusion couples at 1000℃ with different diffusion time. Silicon uphill was found under the influence of aluminum.
关 键 词:Diffusion kinetics Fe-Al-Si system Thermo-calc and DICTRA
分 类 号:TN303[电子电信—物理电子学] TP391.9[自动化与计算机技术—计算机应用技术]
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