降液膜流动孤波中的涡流影响因素分析  

Numerical Analysis on Reversal Flow of Solitary Wave on Falling Liquid Film

作　　者：薄守石[1] 马学虎[1] 兰忠[1] 陈宏霞[1] 白涛[1] 赵研[1] 

机构地区：[1]大连理工大学化学工程研究所,辽宁大连116012

出　　处：《工程热物理学报》2011年第10期1703-1706,共4页Journal of Engineering Thermophysics

基　　金：国家863资助项目(No.2007AA05Z214)

摘　　要：孤波中的涡流被认为是波动强化传热传质机理之一。本文通过数值模拟方法计算了溴化锂溶液沿平板降膜的流动过程。利用VOF方法捕捉降液膜的自由流动表面,利用CSF模型考虑表面张力对降液膜流动的作用,重点研究了扰动频率,Re和倾斜角对孤波中的涡流的影响。模拟结果表明,随着入口扰动频率的增加,涡流经历了完全开式涡,半开式涡至消失的过程。随着Re的增加,除了在孤波前第一个毛细波波谷处出现完全开式涡,在第二个毛细波波谷处也出现涡流。随着倾斜角的降低,最小液膜厚度处的完全开式涡尺度逐渐降低,变为近壁面处的微小涡流,最后消失。Numerical simulation has been made on flow dynamics of falling films of aqueous LiBr solution along a vertical wall.Volume of Fluid（VOF） model is used to track the free surfaces and Continuum Surface Force（CSF） model is used for dynamic boundary conditions considering the effect of surface tension.The focus was placed on reversal flow of solitary wave.The simulation results shows that as the disturbance frequency increases the eddy experiences the process of the fully open one,partial open one and disappeared at last.As the Re number increases,the eddy is encountered in the vicinity of the secondary deepest t（？）ough besides the deepest wave trough in front of solitary wave.Decreasing the inclined angle the scale of the fully open eddy at the deepest trough decreases and disappears ultimately.

关 键 词：LIBR 降膜 涡流 模拟 

分 类 号：TK123[动力工程及工程热物理—工程热物理]