配位剂对低浓度硫酸铬镀铬的影响  

Effect of Complexing Agent on Chromium Plating with Low Chromium Sulfate Concentration

作　　者：毕四富[1] 龚超[1] 屠振密[1] 李宁[1] 

机构地区：[1]哈尔滨工业大学(威海)海洋学院,山东威海264209

出　　处：《电镀与精饰》2011年第9期1-4,共4页Plating & Finishing

摘　　要：环保、成本较低的低浓度硫酸盐三价铬电镀装饰性铬受到广泛关注。在低浓度硫酸铬体系中,研究了配位剂对镀液和镀层性能的影响。实验结果表明,以甲酸钠和苹果酸作为复合配位剂的镀液性能较好。该镀液在pH=3.0,θ=40℃时,所得镀层光亮,电流密度范围较宽,镀液稳定性达10 Ah/L,沉积速率大于0.2μm/min。The trivalent chromium electrolyte with low chromium sulfate concentration used for decorative chrome plating application is getting more attention for its eco-friendly and low-cost characteristics.In this paper,the effect of complexing agents on the bath performance and deposit properties was investigated.The results showed that the optimum bath composition could be obtained when sodium formate and malic acid were used as complexing agents.Under the pH value of 3.0 and temperature of 40℃,the deposited chromium coating has a wide range of bright current density,and the stability and deposition rate of electrolyte could reach to 10 Ah/L and 0.2 μm/min separately.

关 键 词：三价铬电镀铬 硫酸铬 配位剂 

分 类 号：TQ153.11[化学工程—电化学工业]