超临界流体抗溶剂技术及微粒成形机理的研究进展  

Advances of supercritical fluid anti-solvent technology and particle formation mechanism

作　　者：黄盼[1,2] 姜浩锡[1,2,3,4] 李仕昌 张敏华[1,2] 

机构地区：[1]天津大学石油化工技术开发中心,天津300072 [2]天津大学绿色合成与转化教育部重点实验室,天津300072 [3]天津大学化学工程与技术博士后科研流动站,天津300072 [4]山东海化集团博士后科研上作站,山东潍坊262737

出　　处：《化工进展》2011年第10期2120-2125,共6页Chemical Industry and Engineering Progress

基　　金：国家自然科学基金(20976120);天津市应用基础及前沿技术研究计划(09JCYBJC06200)项目

摘　　要：超临界抗溶剂技术是一种新型的超细微粒制备技术,在药物、超导、颜料、炸药和聚合物等领域已有广泛的应用。本文主要介绍了超临界抗溶剂过程和该技术在单组分和多组分无机氧化物纳米粒子制备上的应用,并对超临界抗溶剂微粒成形机理的研究现状和微粒的成形机理进行了简要的概括总结。最后对超临界抗溶剂微粒化技术的发展做了进一步展望。Supercritical anti-solvent（SAS）technology is a novel technique for the preparation of micro-and nano-particles,and has been largely applied in pharmaceuticals,superconductors,coloring matters,explosives and polymers.The supercritical anti-solvent process and its application in the preparation of single and multi-composition inorganic oxide nanoparticles were reviewed.The particle formation mechanism in the SAS process was summarized.The future development of the SAS technology was also proposed.

关 键 词：超临界流体 抗溶剂法 微粒制备 成形机理 

分 类 号：O643[理学—物理化学] TQ02[理学—化学]