低压沉积-微弧氧化制备钛金属HA-TiO_2复合膜层  

HA/TiO_2 Composite Coatings Prepared by Low Voltage Deposition and Micro-arc Oxidation

作　　者：时惠英[1] 李育磊[1] 蒋百灵[1] 

机构地区：[1]西安理工大学材料科学与工程学院,西安710048

出　　处：《表面技术》2011年第5期64-68,共5页Surface Technology

基　　金：博士点基金项目(20106118120013)

摘　　要：采用低压沉积-微弧氧化法,在钛金属表面直接制备了具有生物活性的HA-TiO2复合膜层,通过XRD和SEM分别分析了膜层的相结构和表面形貌,探讨了沉积参数对膜层中HA含量与表面形貌的影响。结果表明:低压沉积处理是微弧氧化法制备HA-TiO2复合膜层的必要条件;复合膜层主要由金红石型和锐钛矿型TiO2及HA组成,HA以白色团簇状存在于膜层之中,或粘附在陶瓷层表面,膜层中的HA含量随电解液中HA添加量的增加而升高。随HA含量增加,膜层孔洞明显增加;沉积电压从30V增加至120V,HA含量增加;沉积时间超过15min,HA含量增加趋于平缓。hydroxyapatite （HA）/TiO~ composite coatings with bioactive on the titanium alloy surface was pre pared hy low voltage deposition and micro-arc oxidation. The phase structure and surface morphology of coatings were analyzed by XRD and SEM respectively. The effects of deposition parameters on the HA content in film and surface morphology were discussed. The results show that low voltage deposition is necessary condition to synthesize HA/Ti（）~ composite coatings on titanium alloy. These coatings consist of anatase TiO2, rutile TiO2 and HA. HA is wrapped up in the coating as white cluster, or adheres to surface of these coatings. The HA content in coatings increases with the HA content increasing in electrolytic solution. With HA content increasing, more pores are observed in coating. The HA content in coatings increases with the deposition voltage boosting from 30 V to 120 V. The increase rate of HA content is not obvious when deposition time over 15 minutes.

关 键 词：微弧氧化 低压沉积 钛合金 羟基磷灰石 

分 类 号：TG274.45[金属学及工艺—铸造]