射频磁控溅射法制备的Eu掺杂ZnO薄膜的结构及其发光性质  

Structural and Photoluminescence Properties of Eu-doped ZnO Thin Films Grown by RF Magnetron Sputtering

作　　者：高振杰[1] 杨元政[1] 谢致薇[1] 王彦利[1] 

机构地区：[1]广东工业大学材料与能源学院,广东广州510006

出　　处：《发光学报》2011年第10期1004-1008,共5页Chinese Journal of Luminescence

基　　金：国家自然科学基金(50771037);高等学校博士学科点专项科研基金(200805620004)资助项目

摘　　要：用射频磁控溅射法在石英衬底上制备了ZnO∶Eu3+薄膜,通过X射线衍射仪﹑扫描电子显微镜和荧光光谱仪测试了薄膜结构﹑形貌以及发光性能,重点考察了溅射功率和退火工艺对其组织结构和发光性能的影响。结果表明:样品均呈现ZnO的六角纤锌矿结构,增大溅射功率有利于形成ZnO的c轴择优取向;增大溅射功率以及高温退火会使晶粒尺寸增大;观察到稀土元素内部4f壳层的电子跃迁以及从ZnO基质到Eu3+离子之间的能量传递现象,增大溅射功率以及780℃退火能提高ZnO∶Eu3+薄膜的发光特性。ZnO∶Eu3＋ thin films were deposited on quartz substrates by radio frequency（RF） magnetron sputtering.The lattice structure,surface morphology and photoluminescence（PL） properties were analyzed by X-ray diffractometer（XRD）,scanning electron microscope（SEM） and spectrometer,respectively.Effects of RF sputtering power and heat treatment on the structure and PL properties were studied in detail.The results showed that all the ZnO films had a hexagonal wurtzite structure and a higher RF sputtering power was beneficial to（002） preferred orientation.The films＇ grains grew up as the RF sputtering power and heat treatment temperature increased.Moreover,we observed the phenomenon of electron transitions in intra-4f shell of Eu3＋ and energy transfer from ZnO host to the doped Eu3＋ in these ZnO∶Eu3＋ films.Besides,as the RF sputtering power increased and after annealed at 780 ℃,the PL properties of ZnO∶Eu3＋ films were obviously improved.

关 键 词：ZnO∶Eu3+ 光致发光 磁控溅射 

分 类 号：O482.31[理学—固体物理] O484.1[理学—物理]